![Electron-beam lithography for polymer bioMEMS with submicron features | Microsystems & Nanoengineering Electron-beam lithography for polymer bioMEMS with submicron features | Microsystems & Nanoengineering](https://media.springernature.com/full/springer-static/image/art%3A10.1038%2Fmicronano.2016.53/MediaObjects/41378_2016_Article_BFmicronano201653_Fig1_HTML.jpg)
Electron-beam lithography for polymer bioMEMS with submicron features | Microsystems & Nanoengineering
![The electron beam lithography (EBL) process for biomimetic particles... | Download Scientific Diagram The electron beam lithography (EBL) process for biomimetic particles... | Download Scientific Diagram](https://www.researchgate.net/publication/24403646/figure/fig2/AS:310175106912257@1450962916407/The-electron-beam-lithography-EBL-process-for-biomimetic-particles-and-the.png)
The electron beam lithography (EBL) process for biomimetic particles... | Download Scientific Diagram
![Schematic illustration of electron beam lithography. Electron beam is... | Download Scientific Diagram Schematic illustration of electron beam lithography. Electron beam is... | Download Scientific Diagram](https://www.researchgate.net/publication/269755032/figure/fig1/AS:398572672569348@1472038538564/Schematic-illustration-of-electron-beam-lithography-Electron-beam-is-focused-on-a-resist.png)
Schematic illustration of electron beam lithography. Electron beam is... | Download Scientific Diagram
![Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography | Nature Communications Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography | Nature Communications](https://media.springernature.com/full/springer-static/image/art%3A10.1038%2Fncomms7654/MediaObjects/41467_2015_Article_BFncomms7654_Fig1_HTML.jpg)
Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography | Nature Communications
![High speed e-beam writing for large area photonic nanostructures — a choice of parameters | Scientific Reports High speed e-beam writing for large area photonic nanostructures — a choice of parameters | Scientific Reports](https://media.springernature.com/lw685/springer-static/image/art%3A10.1038%2Fsrep32945/MediaObjects/41598_2016_Article_BFsrep32945_Fig1_HTML.jpg)
High speed e-beam writing for large area photonic nanostructures — a choice of parameters | Scientific Reports
![Micromachines | Free Full-Text | Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate Micromachines | Free Full-Text | Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate](https://www.mdpi.com/micromachines/micromachines-12-00580/article_deploy/html/images/micromachines-12-00580-g001.png)
Micromachines | Free Full-Text | Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate
![Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays | Microsystems & Nanoengineering Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays | Microsystems & Nanoengineering](https://media.springernature.com/m685/springer-static/image/art%3A10.1038%2Fmicronano.2015.29/MediaObjects/41378_2015_Article_BFmicronano201529_Fig1_HTML.jpg)
Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays | Microsystems & Nanoengineering
![Nature Materials! Exploring direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks - Lehrstuhl für Anorganische und Metallorganische Chemie Nature Materials! Exploring direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks - Lehrstuhl für Anorganische und Metallorganische Chemie](https://www.ch.nat.tum.de/fileadmin/_processed_/2/e/csm_NatMaterPaper2020_051c5e576a.png)
Nature Materials! Exploring direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks - Lehrstuhl für Anorganische und Metallorganische Chemie
![Concept of Electron Beam Direct Writing (EBDW) equipment with Character... | Download Scientific Diagram Concept of Electron Beam Direct Writing (EBDW) equipment with Character... | Download Scientific Diagram](https://www.researchgate.net/publication/240305437/figure/fig5/AS:668499663929350@1536394148200/Concept-of-Electron-Beam-Direct-Writing-EBDW-equipment-with-Character-Projection-CP.png)
Concept of Electron Beam Direct Writing (EBDW) equipment with Character... | Download Scientific Diagram
![Optimization of an electron beam lithography instrument for fast, large area writing at 10 kV acceleration voltage: Journal of Vacuum Science & Technology B: Vol 31, No 4 Optimization of an electron beam lithography instrument for fast, large area writing at 10 kV acceleration voltage: Journal of Vacuum Science & Technology B: Vol 31, No 4](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.4813325&id=images/medium/1.4813325.figures.f4.gif)